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2018年3月出版ⅠMarch 2018


         目录 CONTENTS




         技术 Technology

         34  DSA 和 EUV :实现细间距光刻的互补性技术
             DSA and EUV: the complementary technologies for fine spacing lithography
             - Douglas J. Guerrero 博士,Brewer Science 常驻校际微电子研究中心(imec)专家

         36  ADR AFM 让晶圆缺陷无处可藏
             Wafer defects can't hide from Park Systems

         40  元器件内部和外部界面的倾斜和翘曲
             Mapping tilt and warp of internal and external component interfaces
             - 汤姆 亚当斯 , Sonoscan 公司顾问
         43  无线传感器网络使半导体晶圆制造厂保持高效率运行
             Wireless sensor network keeps semiconductor wafer Fab running efficiently
             - Ross Yu, ADI 公司 Dust Networks 产品部产品市场经理 ; Enrique Aceves, ADI 公司远程办公设施经理

         45  免费冷热源在微电子动力厂房的综合利用
             Comprehensive utilization of free cold & hot sources in power plant for wafer Fab
             - 张华 , 无锡华润微电子有限公司

         7  产业报道 Industry News

         48  广告索引 Ad Index


























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        4    2018年  2/3月   半 导体 芯 科 技                                                         www.cazkreatif.com
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